99.95% Ithagethi ye-Tantalum Sputtering ehlanzekile

Incazelo emfushane:


  • Indawo Yomsuka:I-Henan, China
  • I gama le-brand:Luoyang Forged
  • Inombolo Yemodeli:Ta1
  • Okubalulekile:I-Tantalum
  • Ubuso:ukuwasha/ukupholisha nge-caustic
  • Ubukhulu:ezihlukahlukene
  • Ukuminyana:16.7g/cm3
  • Ubumsulwa:=99.95%
  • Isimo:i-vacuum annealing/intukuthelo/cisha
  • Imininingwane Yomkhiqizo

    Omaka bomkhiqizo

    Indlela Yokukhiqiza Ye-Tantalum Sputtering Target

    Amathagethi e-Tantalum sputtering ngokuvamile akhiqizwa kusetshenziswa izinqubo ze-powder metallurgy.

    Ngale ndlela, i-tantalum powder iyahlanganiswa futhi ifakwe i-sinter ukuze yakhe ipuleti le-tantalum eliqinile. Amashidi ane-sintered abe esecutshungulwa ngezinqubo ezahlukahlukene zokubumba, njengokusebenza ngomshini noma ukugoqa, ukuze kutholwe ubukhulu obufunekayo kanye nokuqedwa kwendawo. Umkhiqizo wokugcina ube usuhlanzwa futhi uhlolwe ukuze kuqinisekiswe ukuthi uhlangabezana nezimfuneko ezidingekayo zohlelo lokufafaza. Le ndlela yokukhiqiza iqinisekisa ukuthi okuhlosiwe kwe-tantalum sputtering kunokuhlanzeka okudingekayo, ukuminyana kanye ne-microstructure ukuze kuzuzwe ukusebenza kahle ezinqubweni zokufakwa kwefilimu emincane.

    Ukusetshenziswa KweI-Tantalum Sputtering Target

    Amathagethi e-Tantalum sputtering asetshenziswa enqubweni yokufaka i-sputter, indlela yokufaka amafilimu amancanyana ezinto ezihlukahlukene ku-substrate. Endabeni ye-tantalum sputtering targets, isetshenziselwa ukufaka amafilimu amancane e-tantalum ezindaweni ezihlukahlukene, njengama-wafers we-semiconductor, ama-coatings, nezinye izinto ze-elekthronikhi. Phakathi nenqubo yokufaka i-sputter, i-tantalum sputtering target ihlaselwa ama-ion anamandla amakhulu, okwenza ama-athomu e-tantalum akhishwe kulokho okuhlosiwe futhi afakwe ku-substrate ngendlela yefilimu encane. Inqubo ivumela ukulawula okunembayo kokujiya kwefilimu nokufana, okwenza kube indlela ebalulekile yokukhiqiza amadivaysi kagesi neminye imikhiqizo yobuchwepheshe obuphezulu. Izinhloso ze-Tantalum sputtering zibaluleke kakhulu ngenxa yendawo yazo ephezulu yokuncibilika, ukungabi namandla kwamakhemikhali, nokuhambisana nezinto ezihlukahlukene ze-substrate, okuzenza zilungele izinhlelo zokusebenza ezidinga amafilimu ahlala isikhathi eside nasezingeni eliphezulu. Lezi zinhloso zivame ukusetshenziswa ekukhiqizeni ama-capacitor, ama-circuits ahlanganisiwe namanye amadivaysi kagesi.

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