99.95% Pure Tantalum Sputtering Target
Tantalum sputtering targets inowanzogadzirwa uchishandisa hupfu hwesimbi.
Nenzira iyi, tantalum hupfu inobatanidzwa uye yakanyungudutswa kuti iite tantalum ndiro yakasimba. Iwo masintered sheets anozogadziriswa kuburikidza neakasiyana ekugadzira maitiro, senge machining kana kukunguruka, kuti awane zviyero zvinodiwa uye kupera kwepamusoro. Chigadzirwa chekupedzisira chinocheneswa nekuongororwa kuti chinosangana nezvinodiwa pakushandisa sputtering. Iyi nzira yekugadzira inovimbisa kuti tantalum sputtering zvibodzwa zvine hutsanana hunodiwa, density uye microstructure kuti iwane kuita kwakaringana mumatete ekuisa firimu maitiro.
Tantalum sputtering targets inoshandiswa mukuita sputter deposition process, nzira yekuisa mafirimu matete emhando dzakasiyana pane substrate. Kana ari tantalum sputtering targets, anoshandiswa kuisa tantalum mafirimu matete pane akasiyana siyana, semiconductor wafers, machira ekuratidzira, uye zvimwe zvinhu zvemagetsi. Munguva yekuisa sputter, tantalum sputtering target inoputirwa nemaion ane simba guru, zvichiita kuti maatomu etantalum abudiswe kubva pane chinangwa uye aiswe pane substrate muchimiro chefirimu rakatetepa. Iyo nzira inobvumira kutonga kwakaringana kwekukora kwemafirimu uye kufanana, zvichiita kuti ive nzira yakakosha yekugadzira zvigadzirwa zvemagetsi uye zvimwe zvigadzirwa zvepamusoro. Tantalum sputtering targets inokosheswa nekuda kwekunyungudika kwayo kwakakwira, kunyungudika kwemakemikari, uye kuenderana nemhando dzakasiyana dze substrate zvinhu, zvichiita kuti ive yakanakira maapplication anoda akasimba uye emhando yepamusoro mafirimu. Izvi zvinangwa zvinowanzoshandiswa mukugadzirwa kwema capacitors, masangano akabatanidzwa uye zvimwe zvigadzirwa zvemagetsi.
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