pure 99.95% tungsten target tungsten disc for industry
Tungsten target material is a product made from pure tungsten powder and has a silver white appearance. It is popular in many fields due to its excellent physical and chemical properties. The purity of tungsten target materials can usually reach 99.95% or higher, and they have characteristics such as low resistance, high melting point, low coefficient of expansion, low vapor pressure, non toxicity, and non radioactivity. In addition, tungsten target materials also have good thermochemical stability and are not prone to volume expansion or contraction, chemical reactions with other substances, and other phenomena.
| Dimensions | As your requirement |
| Place of Origin | Luoyang,Henan |
| Brand Name | FGD |
| Application | Medical, Industry,semiconductor |
| Shape | Round |
| Surface | Polished |
| Purity | 99.95% |
| Grade | W1 |
| Density | 19.3g/cm3 |
| Melting point | 3420℃ |
| Boiling point | 5555℃ |
| Main components |
W＞99.95% |
|
Impurity content≤ |
|
|
Pb |
0.0005 |
|
Fe |
0.0020 |
|
S |
0.0050 |
|
P |
0.0005 |
|
C |
0.01 |
|
Cr |
0.0010 |
|
Al |
0.0015 |
|
Cu |
0.0015 |
|
K |
0.0080 |
|
N |
0.003 |
|
Sn |
0.0015 |
|
Si |
0.0020 |
|
Ca |
0.0015 |
|
Na |
0.0020 |
|
O |
0.008 |
|
Ti |
0.0010 |
|
Mg |
0.0010 |
|
Diameter |
φ25.4mm | φ50mm | φ50.8mm | φ60mm | φ76.2mm | φ80.0mm | φ101.6mm | φ100mm |
| Thickness | 3mm | 4mm | 5mm | 6mm | 6.35 |
1. Our factory is located in Luoyang City, Henan Province. Luoyang is a production area for tungsten and molybdenum mines, so we have absolute advantages in quality and price;
2. Our company has technical personnel with over 15 years of experience, and we provide targeted solutions and suggestions for each customer's needs.
3. All of our products undergo strict quality inspection before being exported.
4. If you receive defective goods, you can contact us for a refund.
1. Powder metallurgy method
(Press tungsten powder into shape and then sinter it at high temperature in a hydrogen atmosphere)
2. Preparation of Sputtering Target Materials
(Deposition of tungsten material onto a substrate to form a thin film)
3. hot isostatic pressing
(Densification treatment of tungsten material by simultaneously applying high temperature and high pressure)
4.Melting method
(Use high temperature to completely melt tungsten, and then make target materials through casting or other forming processes)
5. Chemical vapor deposition
(Method of decomposing gaseous precursor at high temperature and depositing tungsten on substrate)
Thin film coating technology: Tungsten targets are also widely used in thin film coating technologies such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). In PVD process, tungsten target is bombarded by high-energy ions, evaporated and deposited on the surface of the wafer, forming a dense tungsten film. This film has extremely high hardness and wear resistance, which can effectively improve the mechanical strength and durability of semiconductor devices. In CVD process, tungsten target material is deposited on the surface of the wafer through chemical reaction at high temperature to form a uniform coating, which is particularly suitable for use in high-power and high-frequency semiconductor devices.
Molybdenum is often used as a target material in mammography due to its favorable properties for imaging breast tissue. Molybdenum has a relatively low atomic number, which means the X-rays it produces are ideal for imaging soft tissue such as the breast. Molybdenum produces characteristic X-rays at lower energy levels, making them ideal for observing subtle differences in breast tissue density.
In addition, molybdenum has good thermal conductivity properties, which is important in mammography equipment where repeated X-ray exposures are common. The ability to effectively dissipate heat helps maintain the stability and performance of X-ray tubes over extended periods of use.
Overall, the use of molybdenum as a target material in mammography helps optimize the quality of breast imaging by providing appropriate X-ray properties for this specific application.
High brittleness: Tungsten target materials have high brittleness and are susceptible to impact and vibration, which may cause damage.
High manufacturing cost: The manufacturing cost of tungsten target material is relatively high because its production process requires a series of complex procedures and high-precision processing equipment.
Welding difficulty: Welding tungsten target materials is relatively difficult and requires special welding processes and techniques to ensure the integrity of their structure and performance.
High coefficient of thermal expansion: Tungsten target material has a high coefficient of thermal expansion, so when used in high temperature environments, attention should be paid to its size changes and the influence of thermal stress.
