China pure 99.95% tungsten target tungsten disc for industry Manufacturer and Supplier

pure 99.95% tungsten target tungsten disc for industry

Short Description:

Tungsten targets and tungsten disks are commonly used in a variety of industrial applications, especially in thin film deposition and coating processes. Tungsten is known for its high melting point, excellent thermal conductivity and corrosion resistance, making it an ideal material for such applications.

Send email to us Download as PDF

Product Detail

Product Tags

What is a tungsten target?

Tungsten targets are a specialized material used in the physical vapor deposition (PVD) process and are commonly used to produce thin films for a variety of industrial applications. Tungsten targets are typically made from high-purity tungsten and are designed for depositing thin films onto substrates in PVD systems.

In the PVD process, a high-energy source such as an electron beam or plasma is used to bombard a tungsten target, causing atoms to be ejected from the target. These ejected atoms then pass through a vacuum chamber and are deposited onto the surface of a substrate, forming a thin film.

Tungsten targets are valued for their high melting point, which allows them to withstand the high temperatures generated during PVD. In addition, tungsten’s excellent thermal conductivity and corrosion resistance make it an ideal material for PVD systems.

Thin films produced using tungsten targets have a wide range of applications including the semiconductor industry, optics, electronics and solar energy. Film properties, such as conductivity, reflectivity and hardness, can be customized by adjusting the deposition process, making tungsten targets a versatile tool for industrial thin film production.

Why is tungsten used as a target material?

Tungsten is used as a target in the physical vapor deposition (PVD) process for several reasons:

1. High melting point: Tungsten has the highest melting point among all metals, so it is suitable to withstand the high temperatures generated during the PVD process. This allows the tungsten target to withstand thermal stress and maintain its structural integrity during deposition.

2. Thermal conductivity: Tungsten has excellent thermal conductivity and helps dissipate the heat generated during the PVD process. This property is critical to maintaining target stability and ensuring uniform film deposition.

3. Chemically inert: Tungsten has strong resistance to chemical reactions and corrosion, making it an ideal material for the PVD process. In the PVD process, the target material must remain stable in the presence of reactive gases or high-energy plasma.

4. Film quality: Tungsten targets can produce high-quality films with ideal properties such as high density, uniformity and adhesion to substrates, making them suitable for a wide range of industrial applications.

Overall, the unique combination of properties exhibited by tungsten, including high melting point, thermal conductivity and chemical stability, make it an excellent target choice in the PVD process, capable of producing a variety of high-performance films. Industrial applications.