The chemical vapor deposition (CVD) method of diamond involves using a chemical process to synthesize a diamond film or coating in a controlled environment. In this method, a gas mixture, typically containing hydrocarbon gases such as methane, is introduced into a reaction chamber together with a substrate material such as molybdenum wafers or diamond wafers. The gas is then activated by various means, such as heat or plasma, to break down hydrocarbon molecules and deposit carbon atoms onto the substrate, resulting in the growth of diamond crystals.

The CVD process of diamond offers several advantages, including the ability to produce high-quality diamond coatings with precise control of thickness, uniformity and composition. It also allows the deposition of diamond films on a variety of substrate materials, enabling the creation of diamond-coated parts for a variety of industrial and research applications.

Overall, the CVD method of diamond is a versatile and widely used technique for producing synthetic diamond films and coatings with customized properties, making them valuable in industries such as electronics, cutting tools, and wear-resistant coatings.