99.95% Pure Tantalum Sputtering Target
Hoʻohana pinepine ʻia nā pahuhopu sputtering Tantalum me ka hoʻohana ʻana i nā kaʻina metallurgy pauka.
Ma kēia ʻano, hoʻopaʻa ʻia ka pauka tantalum a hoʻopaʻa ʻia e hana i kahi pā tantalum paʻa. Hoʻopili ʻia nā ʻāpana sintered ma o nā kaʻina hana like ʻole, e like me ka machining a i ʻole ka ʻōwili ʻana, e loaʻa ai nā ana i makemake ʻia a me ka pau ʻana o ka ʻili. Hoʻomaʻemaʻe ʻia ka huahana hope a nānā ʻia e hōʻoia i ka hoʻokō ʻana i nā kikoʻī i koi ʻia no ka noi sputtering. Mālama kēia ʻano hana i ka maʻemaʻe pono o ka tantalum sputtering targets, density a me microstructure e hoʻokō ai i ka hana maikaʻi loa i nā kaʻina deposition kiʻiʻoniʻoni.
Hoʻohana ʻia nā pahuhopu sputtering Tantalum i ke kaʻina deposition sputter, kahi ʻano o ka waiho ʻana i nā kiʻiʻoniʻoni lahilahi o nā mea like ʻole ma luna o kahi substrate. I ka hihia o ka tantalum sputtering targets, hoʻohana ʻia lākou e waiho i nā kiʻiʻoniʻoni lahilahi tantalum ma luna o nā ʻano like ʻole, e like me nā wafers semiconductor, nā uhi hōʻike, a me nā mea uila ʻē aʻe. I ka wā o ke kaʻina hana hoʻoheheʻe sputter, ua hoʻokuʻu ʻia ka tantalum sputtering target e nā ion ikehu kiʻekiʻe, e hoʻokuʻu ʻia nā atom tantalum mai ka pahu hopu a waiho ʻia ma ka substrate ma ke ʻano o kahi kiʻiʻoniʻoni lahilahi. Hāʻawi ke kaʻina hana i ka mana pololei o ka mānoanoa kiʻiʻoniʻoni a me ka like ʻole, e lilo ia i mea koʻikoʻi no ka hana ʻana i nā mea uila a me nā huahana ʻenehana kiʻekiʻe. Manaʻo ʻia nā pahuhopu sputtering Tantalum no ko lākou helu heheʻe kiʻekiʻe, ka inertness kemika, a me ka hoʻohālikelike ʻana me nā ʻano mea substrate like ʻole, e hoʻolilo iā lākou i mea kūpono no nā noi e koi ana i nā kiʻiʻoniʻoni lōʻihi a kiʻekiʻe. Hoʻohana pinepine ʻia kēia mau pahuhopu i ka hana ʻana i nā capacitors, nā kaʻa hoʻohui a me nā mea uila ʻē aʻe.
Wechat: 15138768150
WhatsApp: +86 15236256690
E-mail : jiajia@forgedmoly.com
